Welcome to PLASUS
German high-quality plasma spectroscopy
and software solutions
PLASUS is a leading manufacturer of spectroscopic plasma monitor systems. Founded more than 10 years ago, our core competency is in the development of turn-key systems for industry and R&D applications. Our systems are in use for plasma monitoring; process optimization and control; quality control and spectroscopic plasma analysis.
Visit us at V2011
September 30th, 2011
Visit us at V2011 in Dresden
At the V2011 conference we will display our latest products for plasma monitoring and process control:
- Spectroscopic plasma monitor systems
- Coating protection devices for KF/CF window flanges
- Latest in-vacuum optics with improved design
The V2011 conference takes place in Dresden, Germany from October 17th until 20th. We will be happy to see you at our exhibition booth.
October 11th, 2010
New coating protection device for KF40 view ports
Our latest development of coating protection devices for any KF40 view ports allows the use of ex-vacuum optics even in coating applicartions.
The new KF40 coating protection device is a capillary cartridge (honey comb) which fits excatly in a KF40 vacuum flange. The assembly at the vacuum side of the view port is very easy and secure because the KF40 center ring and sealing is mounted to capillary cartridge.
January 15th, 2010
New SpecLine Support Center in Asia
It is a great pleasure to announce the opening of our new SpecLine Support Center in Taiwan. This support center gives qualified support for our spectroscopic analysis software to all SpecLine customers in Asia:
Applied Optivac Technology, Inc.
11F, 286-10, Sec.1, Nan-Kan Road
Lu-Chu Hsiang, Taoyuan 33859
Taiwan, R.O.C.
Phone: +886-3-3120505
Fax: +886-3-3220505
In order to concentrate and maintain the quality of our SpecLine software in the future, in Asia the SpecLine software will be available exclusively from our SpecLine Support Center in Taiwan as of 01 January 2010.
May 4th, 2009
High-Resolution Plasma Monitor System
The new developed EMICON HR system is a spectral high-resolution plasma monitor system (PEM) and first of its kind in the world: it combines a wide spectral range of 200-860 nm with a 10 times better spectral resolution compared to standard systems. This enables the separation of neighboring atomic lines and of rotational and vibrational lines of molecular bands and it extends the scope for plasma analysis, plasma monitoring, quality control and process control. And everything in the familiar robust and industrial-type design ...
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August 24th, 2009
New telephone numbers an postal address
In Augsut PLASUS has moved to new premises from Königsbrunn to Kissing (near Augsburg). The postal address as well as the telephone have changed:
PLASUS
Trathstraße 5 B
D-86438 Kissing
Germany
Phone: +49 8233 735378-0
Fax : +49 8233 735378-9
Please update your contact information.
January 5th, 2009
New EMICON MC Series
As further development of our plasma monitor systems the new EMICON MC systems are now available. The new systems are featuring among others an extended spectral range of 200-1100 nm and a faster recording frequency for multi-channel system realized by real multi-tasking. All data transfer is now managed by a single USB 2.0 line which enables the user to perform control tasks even with notebook computer. The new EMICON 3.1 software comes with various new and advanced features for plasma monitoring, spectral analysis and process control.
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