Welcome to PLASUS

German high-quality plasma spectroscopy
and software solutions

PLASUS is a leading manufacturer of spectroscopic plasma monitor systems. Founded more than 15 years ago, our core competency is in the development of turn-key systems for industry and R&D applications. Our systems are in use for plasma monitoring; process optimization and control; quality control and spectroscopic plasma analysis.

PLASUS News:

September15th, 2014

New +++ Stand-alone EMICON SA System for Industrial Production Lines +++ New

Our latest development for spectroscopic plasma monitoring and controlling - the EMICON SA system - extends our world leading plasma monitor series by decisive features for operation in industrial production lines:

- Integrated processor unit for stand-alone operation
- Multi-channel data acquisition with up to eight spectrometer modules
- Analog inputs for connecting sensor signals
- Worlds fastest data acquistion cycle down to 1 ms
- Easy integration in industrial applications using common communication standards: LAN, Profibus, I/Os, ...

The EMICON SA system combines the outstanding advantages of spectroscopic plasma monitoring for QA/QC, process control and endpoint detection with the requirements of integration to productions lines.

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June 24th, 2014

EMICON systems ready for HIPIMS applications

The plasma monitor systems of the EMICON series are now ready for use in any HIPIMS application without any hardware modification. Due to the spectroscopic design of the EMICON systems new, innovative and unique features are now available:

Controlling the ionization degree and reactive gas flow in HIPIMS applications

For futher information please refer to "More >>" and "News" or contact us under: +49 8233 7253780.

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May 17th, 2013

EMICON system with industrial interfaces PROFIBUS and LAN

All EMICON models have been extended by the industrial interfaces PROFIBUS and LAN and can now be integrated easily in industrial applications.

With the PROFIBUS and LAN interfaces the superior system control can fully control the EMICON system and its parameters and retrieve measuered data continuously.

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March 19th, 2012

In-vacuum collimator optics in SLIM size

The new SLIM vaccum optics comes with considerably smaller outer dimensions compared to the standard optics - however without reducing the light throughput.

Coating systems with limited mounting space can now be equipped with the SLIM collimator optics for measuring the optimal light intensity.

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January 11th, 2011

New coating protection device for view ports

Our latest development of coating protection devices for any view ports allows the use of ex-vacuum optics even in coating applications.

The new coating protection device is a capillary cartridge (honey comb) which fits e.g. excatly in a KF40 vacuum flange. The assembly at the vacuum side of the view port is very easy and secure because the KF40 center ring and sealing is mounted to capillary cartridge.

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January 15th, 2010

New SpecLine Support Center in Asia

It is a great pleasure to announce the opening of our new SpecLine Support Center in Taiwan. This support center gives qualified support for our spectroscopic analysis software to all SpecLine customers in Asia:

Applied Optivac Technology, Inc.
11F, 286-10, Sec.1, Nan-Kan Road
Lu-Chu Hsiang, Taoyuan 33859
Taiwan, R.O.C.
Phone: +886-3-3120505
Fax: +886-3-3220505


In order to concentrate and maintain the quality of our SpecLine software in the future, in Asia the SpecLine software will be available exclusively from our SpecLine Support Center in Taiwan as of 01 January 2010.

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May 4th, 2009

High-Resolution Plasma Monitor System

The new developed EMICON HR system is a spectral high-resolution plasma monitor system (PEM) and first of its kind in the world: it combines a wide spectral range of 200-860 nm with a 10 times better spectral resolution compared to standard systems. This enables the separation of neighboring atomic lines and of rotational and vibrational lines of molecular bands and it extends the scope for plasma analysis, plasma monitoring, quality control and process control. And everything in the familiar robust and industrial-type design ...

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January 5th, 2009

New EMICON MC Series

As further development of our plasma monitor systems the new EMICON MC systems are now available. The new systems are featuring among others an extended spectral range of 200-1100 nm and a faster recording frequency for multi-channel system realized by real multi-tasking. All data transfer is now managed by a single USB 2.0 line which enables the user to perform control tasks even with notebook computer. The new EMICON 3.1 software comes with various new and advanced features for plasma monitoring, spectral analysis and process control.

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