Welcome to PLASUS
German high-quality plasma spectroscopy
and software solutions
PLASUS is a leading manufacturer of spectroscopic plasma monitor systems. Founded more than 10 years ago, our core competency is in the development of turn-key systems for industry and R&D applications. Our systems are in use for plasma monitoring; process optimization and control; quality control and spectroscopic plasma analysis.
Visit us at PSE 2010
August 30th, 2010
Visit us at PSE 2010
At the PSE 2010 conference we will display our latest products for plasma monitoring and process control:
- High-resolution plasma emission monitor system
- Coating protection devices for KF/CF window flanges
- In-vacuum optics in pure alumimum
The PSE 2010 takes place in Garmisch-Partenkirchen, Germany, from September 13th until 17th. We will be happy to see you at our booth.
January 15th, 2010
New SpecLine Support Center in Asia
It is a great pleasure to announce the opening of our new SpecLine Support Center in Taiwan. This support center gives qualified support for our spectroscopic analysis software to all SpecLine customers in Asia:
Applied Optivac Technology, Inc.
11F, 286-10, Sec.1, Nan-Kan Road
Lu-Chu Hsiang, Taoyuan 33859
Taiwan, R.O.C.
Phone: +886-3-3120505
Fax: +886-3-3220505
In order to concentrate and maintain the quality of our SpecLine software in the future, in Asia the SpecLine software will be available exclusively from our SpecLine Support Center in Taiwan as of 01 January 2010.
August 24th, 2009
New telephone numbers an postal address
In Augsut PLASUS has moved to new premises from Königsbrunn to Kissing (near Augsburg). The postal address as well as the telephone have changed:
PLASUS
Trathstraße 5 B
D-86438 Kissing
Germany
Phone: +49 8233 735378-0
Fax : +49 8233 735378-9
Please update your contact information.
May 4th, 2009
High-Resolution Plasma Monitor System
The new developed EMICON HR system is a spectral high-resolution plasma monitor system (PEM) and first of its kind in the world: it combines a wide spectral range of 200-860 nm with a 10 times better spectral resolution compared to standard systems. This enables the separation of neighboring atomic lines and of rotational and vibrational lines of molecular bands and it extends the scope for plasma analysis, plasma monitoring, quality control and process control. And everything in the familiar robust and industrial-type design ...
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January 5th, 2009
New EMICON MC Series
As further development of our plasma monitor systems the new EMICON MC systems are now available. The new systems are featuring among others an extended spectral range of 200-1100 nm and a faster recording frequency for multi-channel system realized by real multi-tasking. All data transfer is now managed by a single USB 2.0 line which enables the user to perform control tasks even with notebook computer. The new EMICON 3.1 software comes with various new and advanced features for plasma monitoring, spectral analysis and process control.
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