Broad band spectrum acquisition
The broad band spectrometers of the system acquire continuously
complete spectra of the plasma light emission from 200 to 1100 nm.
Real time monitoring of plasma emission
Light emission from process relevant plasma particles is observed and
tracked in real time. This allows a continuous monitoring of plasma
conditions and changes are realized instantaneously.
Real-time monitoring gives the capability to optimize the plasma
process by taking advantage of the instant system response on
Analog and digital outputs and inputs are available to install
open and closed loop control functions. This feature can be used,
for example, for end-point detection or for monitoring deviations
from standard plasma process conditions. The integrated digital
PID control function gives direct access to applications where
closed loop control is necessary such as gas flow control or power
control in reactive sputtering applications.
The EMICON MC systems are available with up to 8 independent
spectrometer channels. This enables e.g. multi-chamber process
control or spatial resolved gas flow control in reactive sputtering
Easy set-up for industrial environments
All parts of the system are designed to work in industrial conditions.
The USB 2.0 connectivity to the PC makes the system the first choice
for mobile use at different application.
Industrial interfaces PROFIBUS and LAN
All EMICON models can be extended by the industrial interfaces
PROFIBUS and LAN for easy integration in industrial applications.
There are two EMICON series which satisfy different application types:
EMICON MC: multi-channel standard system for plasma monitoring
and process control.
EMICON HR: spectral high-resolution system for detailed plasma
analysis and plasma monitoring.