EMICON HR

The EMICON HR system is a high-resolution spectrometer system and it is especially qualified for detailed spectral plasma analysis and plasma monitoring but also for quality control and process controlling. The single channel EMICON HR system comes with all features necessary for monitoring and anaylzing process plasmas in detail.

The spectral range of 200-860 nm of the EMICON HR system covers the important parts of the UV-VIS-NIR region. Due to the 10 times better spectral resolution of the EMICON HR system compared to the standard systems neighboring atomic lines or rotational and vibrational lines of molecular bands can be resolved easily. The compact design without any moving parts and the USB 2.0 data transfer makes the EMICON HR system a very mobile system which can be used easily at many applications.
The EMICON software provides extensive features especially for spectral analysis, for plasma analysis and plasma monitoring: arithmetic of spectra, replay of saved data, recipe manager and much more.

EMICON HR Features:EMICON HR Key Notes:

Specifications


EMICON HR
High-Resolution
Number of Channels 1
Wavelength range [nm] 200 - 860
Spectral resolution [nm] 0.15
Signal resolution 16 Bit
Digital in/out 2/2
Analog out 4
Connectivity USB 2.0


Applications


Spectral analysis of process plasmas
Monitoring and optimizing plasma processes
Monitoring of process stability
Endpoint detection in plasma etching
Detection and monitoring plasma impurities


Features


Data acquisition with broad band spectrometer
Real-time monitoring of plasma radiation
Process analysis and process monitoring
Replay of saved data for off-line process analysis
Process control with set-point function
Hardware and software interface for integration into application control
User friendly Windows software


Technical Data


Wavelength range: 200 ... 860 nm
Spectral resolution: 0.15 nm
1 spectrometer channels
Time resolution: approx. 20 ms to hours
Analog outputs: ± 10 volts
Digital inputs and outputs: TTL





Applications:

  • Plasma diagnostics, spectral analysis
  • Film deposition (PVD, PECVD)
  • Plasma etching, end-point detection
  • Quality control, fault detection