Since 1996 PLASUS is developing, manufacturing and marketing innovative and application-oriented plasma monitor and process control systems. Applications range from quality control of PECVD plasmas over active process control in reactive sputter processes and endpoint detection in etching applications to process control of atmospheric plasmas.
25 Years of PLASUS – Innovative products for spectroscopic process monitoring and control
The celebration party will take place as a hybrid event on Thursday, September 23rd, 2021. Please find the program here.
We cordially invite to join us online. Please sign up by sending us an email to firstname.lastname@example.org and you will receive your individual Zoom link soon.
We are looking forward to having you with us at the party!