Founded by Dr.-Ing. Thomas Schütte. Consulting for plasma monitoring and analysis of spectroscopic measurements of plasma processes.
Since today competent and solution-driven customer service is a trademark of PLASUS.
Release of the first version of the PLASUS SpecLine Software. SpecLine is an analytical software tool for any kind of spectroscopic
data with an extensive database of spectral lines and bands for atoms, ions and molecules. The current SpecLine version is still unique
and very popular around the world.
Delivery of the first own spectroscopic plasma monitor system Plasus Monitor. Mainly designed for R&D tasks, this system consisted of
a spectrometer with three interchangeable gratings and a CCD array. Thus, measurements with different spectral resolutions and with
spectral ranges of up to 100 nm were possible. The system was fully controlled by the Plasus Monitor software.
Rollout of the plasma monitor system Plasus EmiCon M including a miniaturized spectrometer module with fixed grating and CCD array.
A spectral range of 700 nm (200-900 nm) was acquired simultaneously. This compact and robust system was the cornerstone of the still
successful and industry-proven EMICON series.
Introduction of the newly developed in-vacuum sensors with coating protection device and optical feedthroughs for KF and CF flanges.
These components are especially designed for use in industrial applications and feature optimal light throughput in the range from UV to NIR
range with easy maintenance.
First sale of an EmiCon system to Asia.
Market launch of plasma monitor system Plasus EmiCon C. This system features hardware and software extensions of analog and digital inputs and outputs,
which allowed a system integration with active process control, e.g. in sputtering or etching applications. In contrast to conventional filter-type
PEM systems the EmiCon C system offered spectroscopic control features for production lines for the first time worldwide. This includes stable
long-term process control by line ratios and reduction of superimposed line signals.
Applied Optivac Technolgy Inc. (AOT) in Taiwan becomes official sales and service center for Asia.
First multi-channel plasma monitor system Plasus EmiCon C with three spectrometer modules working simultaneously. With this development concurrent
spectroscopic measurements at different positions were realized for the first time and thus large area application could benefit from the advantages
of spectroscopic plasma monitoring and process control.
Setup and expansion of the distributor network in Japan, Korea, Taiwan and China.
Rollout of modular PLASUS EMICON MC system with up to eight spectrometer units. The number of spectrometer units and control inputs and outputs
are configurable according to customer requirements and can even be upgraded later on. The modular design and industrial interfaces facilitate
custom-designed setups for industrial applications and production lines.
Introduction of high-resolution system PLASUS EMICON HR featuring a spectral resolution almost 10 times better compared to EMICON MC systems.
This unique system closes the gap between scientific analysis and concurrent spectroscopic plasma monitoring and process control. It is used
primarily for pre-development of machines and processes.
The optical components are extended by the in-vacuum-SLIM-sensors featuring a slimmer form factor but maintaining the same light throughput.
Delivering the 100th EMICON system with more than 250 spectrometer units to industry and R&D.
Market launch of stand-alone system PLASUS EMICON SA optimized for operation in production lines. Worldwide first turnkey multi-channel spectroscopic
plasma monitor system with integrated processor unit for easy and straightforward integration in plasma process plants.
PLASUS becomes a GmbH and moves to new and larger facilities in Mering in the vicinity of Augsburg.
robeko GmbH & Co.KG and PLASUS GmbH agree an strategic technology and sales cooperation. robeko becomes sales partner of PLASUS products for industrial customers in Europe.
Angstrom Sciences Inc. in Duquesne, PA, USA becomes official distributor for North America.
Introduction of EMICON SA PULSE and HIPIMS Module providing a new and worldwide unique process control technique for pulsed highly-ionized reactive plasma processes, such as HIPIMS applications.
Extending the product range by spectroscopic reflection and transmission modules for the EMICON systems. This enables the user to monitor layer parameters such as reflection,
transmission, thisckness, color values, etc. in real-time in the porcess.
25 Years PLASUS with innovative products for spectroscopic process monitoring and control.
450 EMICON systems with more than 850 spectrometer units sold.