Join us at the Virtual HiPIMS Today 2022 from January 25th until January 27th, 2022
This workshop will deal with recent development of High-Power Impulse Magnetron Sputtering (HiPIMS).
It will provide a networking environment with oral presentations, poster presentations and exhibits.
PLASUS will present its latest product developments for HiPIMS applications in an Industral Pesentation on January 26th (Day 2) at 6:50 am UTC:
Process control by simultaneous pulse shape and plasma emission monitoring
You are also invited to meet our experts in the PLASUS exhibit breakout room to discuss your application and to learn more about our other latest developments:
– The new SPECLINE software – Advanced and easy anaylsis of spectral data
– In-situ process and layer control – Combining process control techniques
Please view the full workshop program and register at the HiPIMS Today 2022 website.
We are looking forward to meeting you online!