SVC TechCon 2021 Virtual

3rd until May 7th, 2021. At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring.
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Novel EMICON PULSE & HIPIMS Module for Pulsed Reactive Sputter Prozesses

The new pulse and HIPIMS sensor of the EMICON SA system acquires the pulse current and pulse voltage curves and combines the evaluation of the electrical data with the data from the spectroscopic plasma monitoring technology in a single system. Thus, independent control the ionization degree and reactive gas flow is now possible in reactive pulse …
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