EMICON SA SYSTEM
PROCESS CONTROL FOR PRODUCTION LINES
The EMICON SA systems are the first choice for comprehensive process control and quality assurance of plasma processes in production lines. With the unique acquisition and combination of all important process data in one system in real time, the EMICON systems are the worldwide benchmark for successful process control.
EMICON SA-HIPIMS SYSTEM
PROCESS CONTROL FOR PULSED APPLICATIONS
The EMICON SA-HIPIMS system records voltage and current waveforms in pulsed (HIPIMS) plasma processes with high temporal resolution in addition to spectral datameasurement. This unique combination of data acquisition allows the indepenedent control of ion density and gas composition. In reactive processes, this opens the door of adjusting stoichiometric and morphological layer properties separately.
EMICON MC SYSTEM
PLASMA MONITORING AND PROCESS OPTIMIZATION
The EMICON MC systems are ideal plasma monitor systems for R&D and are suitable for almost any application in plasma technology for plasma analysis, plasma monitoring, process optimization, quality assurance and process control.
EMICON LC SYSTEM
THIN FILM CONTROL
The EMICON LC system is an ideal extension of the EMICON SA and EMICON MC systems for in-situ real-time monitoring of transmission, reflection, absorption, color or coating thickness on the workpiece during the plasma process.
EMICON HR SYSTEM
HIGH RESOLUTION PLASMA ANALYSIS
The EMICON HR system is a spectral high-resolution plasma monitor system and is particularly suitable for detailed spectral plasma analysis and for plasma monitoring as well as for quality assurance and process control.
OPTIC COMPONENTS
ROBUST AND LOW-MAINTANANCE SENSORS
The optical components are the link between the application process and the detection system: All PLASUS components are optimized to transmit maximum light intensity while maintaining flexibility and durability in industrial environments.