PLASUS introduces its katest cutting edge development for HIPIMS and pulsed plasma applications: The unprecedented time resolution of the new EMICON FS system sets groundbreaking and worldwide unique standards in industrial process control.
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With the completely revised SPECLINE 3 software, PLASUS sets new standards in the analysis and identification of spectral data. The new SPECLINE 3 version features a completely new, modern and intuitive user interface. Convince yourself of the unique features of the new SPECLINE 3 and request the free trial version.
The new pulse and HIPIMS sensor of the EMICON SA system acquires the pulse current and pulse voltage curves and combines the evaluation of the electrical data with the data from the spectroscopic plasma monitoring technology in a single system. Thus, independent control the ionization degree and reactive gas flow is now possible in reactive pulse and HIPIMS process and opens the door to many new applications in R&D and industry.