Spectroscopic plasma monitor systems
Process control for industry and R&D
PLASUS is a leading manufacturer of spectroscopic plasma monitor and process control systems.
Founded more than 20 years ago, our core competence is the development of turn-key process control
systems for industry and R&D applications. Our systems are applied for plasma monitoring,
process control, process optimization, quality control and spectroscopic plasma analysis.
Benefit from our long years of experience and leading know-how - we will be at your service and advise you comprehensively for your application!
September 2nd, 2019
Latest Process Control Developments at V2019 in Dresden, Germany
At the V2019 Workshop Week & Industrial Exhibition taking place at the International Congress Center Dresden, Germany we will display our latest developments for plasma monitoring and process control.
In the workshop presentation Prozesscharakterisierung und Prozesskontrolle in Vakuumbeschichtungsanlagen Dr. Thomas Schütte will outline the recent trends of process control for sputtering and PECVD application, such as industrial measurement systems with combined control techniques and system integration in the framework of Industry 4.0
At the accompanying industrial exhibition of the V2019 conference from October 9th thru 10th we will display our latest products at booth #15 and we are looking forward to discussing with you their use in your application.
On Wednesday, October 09th, the exhibtion is open to the public without conference registration!
September 24th, 2018
Novel control technique for reactive pulse and HIPIMS processes
This latest development in sensor technology of PLASUS opens new and exciting capabilities in controlling process parameters in reactive pulse and HIPIMS plasma.
The new EMICON SA Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.
August 18th, 2018
Introducing novel EMICON Pulse and HIPIMS module at PSE 2018
At the PSE 2018 conference in Garmisch-Partenkirchen - Germany, PLASUS introduces its latest development for advanced plasma monitoring and process control:
The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications. You are invited to learn more about this new and exciting technique in a presentation in the HiPIMS II session.
Please meet us also at the industrial exhibition of the PSE 2018 conference on September 18th and 19th. We are looking forward to seeing you at our exhibition booth #34.
On Wednesday, September 19th, the exhibtion is open to the public without conference registration!
November 10th, 2016
Angstrom Sciences becomes distributor for North America
Effective November 1st, 2016, Angstrom Sciences, Inc. has become exclusive distributor of PLASUS products in North America.
Angstrom Sciences, Inc., headquartered in Pittsburgh, PA, USA, is the premier global supplier of magnetron technology used to produce thin films through the “sputtering” process. The plasma monitor and process control systems of PLASUS are complementing the product range of Angstrom Sciences excellently.
Angstrom Sciences has an excellent sales network across North America and will now support customers in all issues regarding palsma analysis and process control.
August 8th, 2016
robeko is new representative and cooperation partner of PLASUS in Europe
Since January 2016 robeko GmbH & Co. KG is official distributor of PLASUS products in Germany, Benelux and France.
robeko is a leading manufacturer and vendor of sputtering targets and bond services as well as a supplier of highest quality process hardware for thin film deposition, especially for sputtering. The plasma monitor and process control systems of PLASUS are complementing the product range of robeko excellently.
Along with the representation of PLASUS products the companies agreed in a close partnership with the aim to develop innovative plasma processes for sputtering and PECVD. In this partnership robeko provides its competences and coating equipment.
June 23rd, 2016
PLASUS celebrates 20th anniversay with ceremony!
Since 1996 PLASUS is developing, manufacturing and marketing innovative and application-oriented plasma monitor and process control systems. Applications range from quality control of PECVD plasmas over active process control in reactive sputter processes and endpoint detection in etching applications to process control of atmospheric plasmas.
On June 23rd, 2016 PLASUS celebrated the 20th company anniversary with many guests from home and abroad with a ceremony and party in the premises in Mering, Germany.
September 21st, 2015
Stand-alone EMICON SA System for Industrial Production Lines
Our latest development for spectroscopic plasma monitoring and controlling - the EMICON SA system - extends our world leading plasma monitor series by decisive features for operation in industrial production lines:
- Integrated processor unit for stand-alone operation
- Multi-channel data acquisition with up to eight spectrometer modules
- Analog inputs for connecting sensor signals
- World's fastest data acquisition cycle down to 1 ms
- Easy integration in industrial applications using common communication standards: LAN, Profibus, I/Os, ...
The EMICON SA system combines the outstanding advantages of spectroscopic plasma monitoring for QA/QC, process control and endpoint detection with the requirements of integration to productions lines.
May 22nd, 2015
PLASUS GmbH has moved to new facility
In May PLASUS GmbH has moved to new and larger premises in Mering (near Augsburg). The postal address has changed to:
Telephone numbers and email addresses remain the same. Please update your contact information.
February 9th, 2015
PLASUS becomes GmbH
On January 15th, 2015 PLASUS has become PLASUS GmbH.
With this step, PLASUS is well prepared for more successful years and lays the foundation for further growth, new products and implementing strategic objectives.
Our customers will be served by the same contact persons and with the same competent service as in the past - however, some administrative contact details must be updated. Please find more details here.
May 17th, 2013
EMICON system with industrial interfaces PROFIBUS and LAN
All EMICON models have been extended by the industrial interfaces PROFIBUS and LAN and can now be integrated easily in industrial applications.
With the PROFIBUS and LAN interfaces the superior system control can fully control the EMICON system and its parameters and retrieve measuered data continuously.
March 19th, 2012
In-vacuum collimator optics in SLIM size
The new SLIM vaccum optics comes with considerably smaller outer dimensions compared to the standard optics - however without reducing the light throughput.
Coating systems with limited mounting space can now be equipped with the SLIM collimator optics for measuring the optimal light intensity.
January 11th, 2011
New coating protection device for view ports
Our latest development of coating protection devices for any view ports allows the use of ex-vacuum optics even in coating applications.
The new coating protection device is a capillary cartridge (honey comb) which fits e.g. excatly in a KF40 vacuum flange. The assembly at the vacuum side of the view port is very easy and secure because the KF40 center ring and sealing is mounted to capillary cartridge.
January 15th, 2010
New SpecLine Support Center in Asia
It is a great pleasure to announce the opening of our new SpecLine Support Center in Taiwan. This support center gives qualified support for our spectroscopic analysis software to all SpecLine customers in Asia:
Applied Optivac Technology, Inc.
11F, 286-10, Sec.1, Nan-Kan Road
Lu-Chu Hsiang, Taoyuan 33859
In order to concentrate and maintain the quality of our SpecLine software in the future, in Asia the SpecLine software will be available exclusively from our SpecLine Support Center in Taiwan as of 01 January 2010.
January 5th, 2009
New EMICON MC Series
As further development of our plasma monitor systems the new EMICON MC systems are now available. The new systems are featuring among others an extended spectral range of 200-1100 nm and a faster recording frequency for multi-channel system realized by real multi-tasking. All data transfer is now managed by a single USB 2.0 line which enables the user to perform control tasks even with notebook computer. The new EMICON 3.1 software comes with various new and advanced features for plasma monitoring, spectral analysis and process control.More >>