PLASUS

Spectroscopic plasma monitor systems
Process control for industry and R&D

PLASUS is a leading manufacturer of spectroscopic plasma monitor and process control systems. Founded more than 20 years ago, our core competence is the development of turn-key process control systems for industry and R&D applications. Our systems are applied for plasma monitoring, process control, process optimization, quality control and spectroscopic plasma analysis.

Benefit from our long years of experience and leading know-how - we will be at your service and advise you comprehensively for your application!

PLASUS News:

April 5th, 2021

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring. Please join us at the following presentations:

How to overcome the reluctance to control production processes actively
HIPIMS session, Tuesday, May 4th, 1:00pm EDT (19:00 CET), Track A - Block 2

Beyond PEM for production lines - Advanced and versatile process control system EMICON SA
Vendor Innovators Showcase, Wednesday, May 5th, 11:10pm EDT (17:10 CET), Track B - Block 1

Please view the full
technical program and register at the SVC TechCon 2019 Virtual website. Due to the virtual format registration fee for attending all technical sessions is extremely affordable and attractive.

We are looking forward to meeting you online!

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January 10th, 2021

Meet us at HIPIMS Today 2021 conference

At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

Please meet us also at our virtual exhibition booth.

Participating in the conference is free of charge. Please register here: HiPIMS Today 2021.

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March 27th, 2020

Business continues at PLASUS despite restrictions due to COVID-19 Pandemic

The restrictions of public and private life are severe due to the COVID-19 pandemic.

Despite this situation, the staff of PLASUS GmbH is still on duty for our customers. A skeleton crew keeps the headquarter running. All other staff is working from homeoffice and can be reached easily by email. Production is slowed down a bit, but all deliveries will be on time.

While the restrictions for meetings are effective, we will not schedule any customer appointments.

PLASUS GmbH, Phone: +49 8233 7353780, Mail: service@plasus.de


November 14th, 2019

Latest Developments on Reactive Sputtering Control at RSD 2019 in Braunschweig, Germany

At the RSD 2019 conference taking place at the Fraunhofer IST in Braunschweig, Germany we will display our latest developments for plasma monitoring and process control.

In the conference presentation Novel control technique for reactive HIPIMS processes to secure production stability over a target lifetime Dr. Thomas Schütte will introduce a new control technique for HIPIMS processes.

At the accompanying industrial exhibition we will display our latest products at booth #1 and we are looking forward to discussing with you their use in your application.

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September 24th, 2018

Novel control technique for reactive pulse and HIPIMS processes

This latest development in sensor technology of PLASUS opens new and exciting capabilities in controlling process parameters in reactive pulse and HIPIMS plasma.

The new EMICON SA Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

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November 10th, 2016

Angstrom Sciences becomes distributor for North America

Effective November 1st, 2016, Angstrom Sciences, Inc. has become exclusive distributor of PLASUS products in North America.
Angstrom Sciences, Inc., headquartered in Pittsburgh, PA, USA, is the premier global supplier of magnetron technology used to produce thin films through the “sputtering” process. The plasma monitor and process control systems of PLASUS are complementing the product range of Angstrom Sciences excellently.
Angstrom Sciences has an excellent sales network across North America and will now support customers in all issues regarding palsma analysis and process control.

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August 8th, 2016

robeko is new representative and cooperation partner of PLASUS in Europe

Since January 2016 robeko GmbH & Co. KG is official distributor of PLASUS products in Germany, Benelux and France.
robeko is a leading manufacturer and vendor of sputtering targets and bond services as well as a supplier of highest quality process hardware for thin film deposition, especially for sputtering. The plasma monitor and process control systems of PLASUS are complementing the product range of robeko excellently.
Along with the representation of PLASUS products the companies agreed in a close partnership with the aim to develop innovative plasma processes for sputtering and PECVD. In this partnership robeko provides its competences and coating equipment.

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June 23rd, 2016

PLASUS celebrates 20th anniversay with ceremony!

Since 1996 PLASUS is developing, manufacturing and marketing innovative and application-oriented plasma monitor and process control systems. Applications range from quality control of PECVD plasmas over active process control in reactive sputter processes and endpoint detection in etching applications to process control of atmospheric plasmas.
On June 23rd, 2016 PLASUS celebrated the 20th company anniversary with many guests from home and abroad with a ceremony and party in the premises in Mering, Germany.

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September 21st, 2015

Stand-alone EMICON SA System for Industrial Production Lines

Our latest development for spectroscopic plasma monitoring and controlling - the EMICON SA system - extends our world leading plasma monitor series by decisive features for operation in industrial production lines:

- Integrated processor unit for stand-alone operation
- Multi-channel data acquisition with up to eight spectrometer modules
- Analog inputs for connecting sensor signals
- World's fastest data acquisition cycle down to 1 ms
- Easy integration in industrial applications using common communication standards: LAN, Profibus, I/Os, ...

The EMICON SA system combines the outstanding advantages of spectroscopic plasma monitoring for QA/QC, process control and endpoint detection with the requirements of integration to productions lines.

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May 22nd, 2015

PLASUS GmbH has moved to new facility

In May PLASUS GmbH has moved to new and larger premises in Mering (near Augsburg). The postal address has changed to:

PLASUS GmbH
Lechstraße 9
D-86415 Mering
Germany


Telephone numbers and email addresses remain the same. Please update your contact information.

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February 9th, 2015

PLASUS becomes GmbH

On January 15th, 2015 PLASUS has become PLASUS GmbH.

With this step, PLASUS is well prepared for more successful years and lays the foundation for further growth, new products and implementing strategic objectives.

Our customers will be served by the same contact persons and with the same competent service as in the past - however, some administrative contact details must be updated. Please find more details here.

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May 17th, 2013

EMICON system with industrial interfaces PROFIBUS and LAN

All EMICON models have been extended by the industrial interfaces PROFIBUS and LAN and can now be integrated easily in industrial applications.

With the PROFIBUS and LAN interfaces the superior system control can fully control the EMICON system and its parameters and retrieve measuered data continuously.

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March 19th, 2012

In-vacuum collimator optics in SLIM size

The new SLIM vaccum optics comes with considerably smaller outer dimensions compared to the standard optics - however without reducing the light throughput.

Coating systems with limited mounting space can now be equipped with the SLIM collimator optics for measuring the optimal light intensity.

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January 11th, 2011

New coating protection device for view ports

Our latest development of coating protection devices for any view ports allows the use of ex-vacuum optics even in coating applications.

The new coating protection device is a capillary cartridge (honey comb) which fits e.g. excatly in a KF40 vacuum flange. The assembly at the vacuum side of the view port is very easy and secure because the KF40 center ring and sealing is mounted to capillary cartridge.

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January 15th, 2010

New SpecLine Support Center in Asia

It is a great pleasure to announce the opening of our new SpecLine Support Center in Taiwan. This support center gives qualified support for our spectroscopic analysis software to all SpecLine customers in Asia:

Applied Optivac Technology, Inc.
11F, 286-10, Sec.1, Nan-Kan Road
Lu-Chu Hsiang, Taoyuan 33859
Taiwan, R.O.C.
Phone: +886-3-3120505
Fax: +886-3-3220505


In order to concentrate and maintain the quality of our SpecLine software in the future, in Asia the SpecLine software will be available exclusively from our SpecLine Support Center in Taiwan as of 01 January 2010.

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January 5th, 2009

New EMICON MC Series

As further development of our plasma monitor systems the new EMICON MC systems are now available. The new systems are featuring among others an extended spectral range of 200-1100 nm and a faster recording frequency for multi-channel system realized by real multi-tasking. All data transfer is now managed by a single USB 2.0 line which enables the user to perform control tasks even with notebook computer. The new EMICON 3.1 software comes with various new and advanced features for plasma monitoring, spectral analysis and process control.

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