Don't miss the opportunity to get to experience the latest PLASUS development for plasma monitoring and process control of HIPIMS processes: The EMICON FS system with the unique feature of continuous pulse-resolved spectroscopic measurement of HIPIMS pulses.
Thomas Schütte
24 posts
In May, PLASUS showcases its latest development for plasma monitoring and process control at two major international conferences in the USA. Don't miss the opportunity to discover the unique capabilities of our new EMICON models presented in oral presentations by our experts and at the accopompanying exhibitions.
Meet the experts of PLASUS at the following conferences and exhibitions in 2025:
- HIPIMS Today 2025, Online
- ICMCTF 2025, San Diego, USA
- SVC TechCon 2025, Nashville, USA
- HIPIMS 2025, Braunschweig, Germany
- V2025, Dresden, Germany
On 21 and 22 January 2025, PLASUS and the Fraunhofer IST were delighted to welcome more than 60 participants to an intensive and inspiring workshop on the topic of "Process Control in Production Lines - Latest Development and Future Trends".
At the Plasma Surface Engineering PSE 2024 conference from September 2 to 5, 2024 in Erfurt, Germany, PLASUS will present its latest development for plasma monitoring and process control. Meet our experts at the exhibition booth #29.
At the ISSP 2024 conference in Kyoto, Japan, from July 2 to July 5, PLASUS will present its latest development for plasma monitoring and process control. Learn more in the presentation by our expert and at our exhibition booth in the atrium of the Kyoto Research Park.
At the ICMCTF 2024 conference from May 19 to May 24, 2024 in San Diego, CA, PLASUS will present its latest development for plasma monitoring and process control. Learn more in the presentation by our expert and at our exhibition booth #419.
At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more in three presentations by our experts and at our exhibition booth #911.
PLASUS introduces its katest cutting edge development for HIPIMS and pulsed plasma applications: The unprecedented time resolution of the new EMICON FS system sets groundbreaking and worldwide unique standards in industrial process control.
Meet the experts of PLASUS at the following conferences and exhibitions in 2024:
- HIPIMS Today 2024, Online
- SVC TechCon 2024, Chicago, USA
- 13th ICMCTF 2024, San Diego, USA
- ICCG 2024, Dresden, Germany
- ISSP 2024, Kyoto, Japan
- PSE 2024, Erfurt, Germany