On 21 and 22 January 2025, PLASUS and the Fraunhofer IST were delighted to welcome more than 60 participants to an intensive and inspiring workshop on the topic of "Process Control in Production Lines - Latest Development and Future Trends".
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PLASUS introduces its katest cutting edge development for HIPIMS and pulsed plasma applications: The unprecedented time resolution of the new EMICON FS system sets groundbreaking and worldwide unique standards in industrial process control.
Bob Rovnanik and his Team of Angstrom Scienes, Inc. has been recognized as Distributor of The Year 2022 for their outstanding performance and commitment to the distribution of PLASUS`products in North-America.
With the completely revised SPECLINE 3 software, PLASUS sets new standards in the analysis and identification of spectral data. The new SPECLINE 3 version features a completely new, modern and intuitive user interface. Convince yourself of the unique features of the new SPECLINE 3 and request the free trial version.
On 23 September 2021, PLASUS celebrated its 25th anniversary in a hybrid event. In addition to the 30 guests on site, more than 70 online guests from Europe, Asia, America and Australia followed the interesting presentations and contributions.
The new pulse and HIPIMS sensor of the EMICON SA system acquires the pulse current and pulse voltage curves and combines the evaluation of the electrical data with the data from the spectroscopic plasma monitoring technology in a single system. Thus, independent control the ionization degree and reactive gas flow is now possible in reactive pulse and HIPIMS process and opens the door to many new applications in R&D and industry.