At the 15. OPTATEC International Trade Fair for Optical Technologies, Components and Systems from October 18 to 20, 2022 in Frankfurt, Germany, PLASUS will present its latest development for plasma monitoring and process control. Meet our experts at the robeko booth #E120.
Thomas Schütte
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At the PSE 2022 conference from September 12 to 15, 2022 in Erfurt, Germany, PLASUS will present its latest development for plasma monitoring and process control. Meet our experts at the exhibition booth #29.
At the SVC TechCon 2022 conference from April 30 to May 5, 2022 in Long Beach, CA, PLASUS will present its latest development for plasma monitoring and process control. Learn more in two presentations by our experts and at our exhibition booth #531.
With the completely revised SPECLINE 3 software, PLASUS sets new standards in the analysis and identification of spectral data. The new SPECLINE 3 version features a completely new, modern and intuitive user interface. Convince yourself of the unique features of the new SPECLINE 3 and request the free trial version.
Join us at the Virtual HiPIMS Today 2022 from January 25th until January 27th, 2022. This workshop will deal with recent development of High-Power Impulse Magnetron Sputtering (HiPIMS). PLASUS will present its latest product developments for HiPIMS applications in its exhibitor break room.
On 23 September 2021, PLASUS celebrated its 25th anniversary in a hybrid event. In addition to the 30 guests on site, more than 70 online guests from Europe, Asia, America and Australia followed the interesting presentations and contributions.
3rd until May 7th, 2021. At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring.
The new pulse and HIPIMS sensor of the EMICON SA system acquires the pulse current and pulse voltage curves and combines the evaluation of the electrical data with the data from the spectroscopic plasma monitoring technology in a single system. Thus, independent control the ionization degree and reactive gas flow is now possible in reactive pulse and HIPIMS process and opens the door to many new applications in R&D and industry.